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Ion-Optical Characteristics of Negative H exp - -Ion Beams Generated by Surface-Plasma Sources

机译:表面等离子体源产生的负H exp - 离子束的离子光学特性

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The ion-optical characteristics of H exp - ion beams generated by surface-plasma sources with a Penning configuration of the gas discharge cell were studied. H exp - ion beams with a pulse intensity of 0.1 to 0.15 A, duration of 250 mu sec, and repetition rate up to 100 Hz were obtained. The ion energy was 20 to 25 keV. The emission slit, 0.5 . 10 mm exp 2 , was oriented across the magnetic field. Quasi-parallel beams with an ordered divergence of 10 exp -2 radn per cm of transverse dimension were formed. When the fluctuations were eliminated, the normalized emittance in the direction parallel to the field decreased from 0.05 cm mradn to 0.003 cm mradn, in the perpendicular direction from 0.2 cm mradn to 0.02 cm mradn, and the energy scatter of transverse motion, from 1.5 keV to 5 eV and 80 eV to 1 eV, respectively. (ERA citation 03:020723)

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