首页> 外国专利> Composite particle for polishing, method for producing composite particle for polishing, and slurry for polishing

Composite particle for polishing, method for producing composite particle for polishing, and slurry for polishing

机译:研磨用复合粒子,研磨用复合粒子的制造方法以及研磨用浆料

摘要

Provided is a composite particle for polishing obtained by supporting a metal oxide on silica particles, which has a high polishing rate and can obtain a smooth polished surface. The half-width of the maximum peak in the X-ray diffraction using the CuKα ray as the radiation source of the metal oxide by the powder X-ray diffraction measurement is 0, which is composed of composite silica particles having the metal oxide supported on the surface of the silica particles. A composite particle for polishing characterized by an angle of 45 to 1.0 °.
机译:本发明提供了一种通过将金属氧化物负载在二氧化硅颗粒上而获得的用于抛光的复合颗粒,该复合颗粒具有高的抛光速率并且可以获得光滑的抛光表面。通过粉末X射线衍射测量,使用CuKα射线作为金属氧化物的放射源的X射线衍射中的最大峰的半峰宽为0,其由负载有金属氧化物的复合二氧化硅颗粒构成。二氧化硅颗粒的表面。用于抛光的复合颗粒,其特征在于45至1.0°的角度。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号