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Method for producing indium oxide-tin oxide powder, method for producing ITO target, and method for producing indium hydroxide-metastannic acid mixture
Method for producing indium oxide-tin oxide powder, method for producing ITO target, and method for producing indium hydroxide-metastannic acid mixture
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机译:氧化铟-氧化锡粉末的制造方法,ITO靶的制造方法以及氢氧化铟-烷酸混合物的制造方法
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摘要
A method in which an ITO target scrap containing indium and tin is reduced with a reducing gas in a reduction furnace, and an indium-tin alloy as a raw material for the ITO target is recovered while maintaining the composition ratio of the metal components in the ITO. The indium-tin alloy is recovered from the high-purity indium oxide-tin-containing scrap generated during or after the production of the ITO sputtering target, and this is used as indium oxide-tin oxide powder, and this indium oxide-tin oxide powder is used as a raw material. A technique for manufacturing an ITO target is provided. That is, scrap is directly reduced to an alloy and used for ITO production while maintaining the composition of the obtained alloy, thereby simplifying the control and adjustment of the composition in the production process. In addition, the process can be simplified by reducing the oxide only by recycling indium-tin, and the manufacturing cost can be reduced as compared with the conventional method. Furthermore, since the by-product can be only water, the handling and generation of harmful substances can be suppressed, thereby reducing the burden on the environment. [Selection] Figure 3
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