首页> 外国专利> METHODS, APPARATUS, AND SYSTEM FOR GLOBAL HEALING OF WRITE-LIMITED DIE THROUGH BIAS TEMPERATURE INSTABILITY

METHODS, APPARATUS, AND SYSTEM FOR GLOBAL HEALING OF WRITE-LIMITED DIE THROUGH BIAS TEMPERATURE INSTABILITY

机译:通过偏置温度不稳定性对写受限管芯进行整体修复的方法,装置和系统

摘要

We disclose methods, apparatus, and systems for improving semiconductor device writeability through bias temperature instability. Such a device may comprise a plurality of cells of an array, wherein each of the cells comprises a pass gate and a latch; a plurality of word lines, wherein each word line comprises a supply voltage line (VCS) which supplies voltage to each latch of a first number of cells; an array VCS driver electrically connected to each VCS; and a control line configured to provide an operational array supply voltage, a first array supply voltage, or a second array supply voltage to each VCS through the array VCS driver.
机译:我们公开了通过偏置温度不稳定性来改善半导体器件可写性的方法,装置和系统。这样的器件可以包括阵列的多个单元,其中每个单元包括通过门和锁存器;以及多个字线,其中每个字线包括向第一数量的单元的每个锁存器提供电压的电源电压线(VCS);阵列VCS驱动器电连接到每个VCS;控制线,被配置为通过阵列VCS驱动器向每个VCS提供操作阵列电源电压,第一阵列电源电压或第二阵列电源电压。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号