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Low Temperature Poly-Silicon Thin Film, Low-Temperature Poly-Silicon Thin Film Transistor and Manufacturing Methods Thereof, and Display Device

机译:低温多晶硅薄膜,低温多晶硅薄膜晶体管及其制造方法,显示装置

摘要

The present application provides a low temperature poly-silicon thin film, a low temperature poly-silicon thin film transistor and manufacturing methods thereof, and a display device. The manufacturing method of a low temperature poly-silicon thin film comprises steps of: forming an amorphous silicon thin film on a base; and performing a laser annealing process on the amorphous silicon thin film by using a mask plate to form a low temperature poly-silicon thin film, wherein the mask plate includes a transmissive region and a shielding region surrounding the transmissive region, and two sides of the shielding region adjacent to the transmissive region are in concave-convex shapes. Performance of the low temperature poly-silicon thin film formed by the manufacturing method of a low temperature poly-silicon thin film in the present application is enhanced.
机译:本申请提供了一种低温多晶硅薄膜,一种低温多晶硅薄膜晶体管及其制造方法和显示装置。低温多晶硅薄膜的制造方法包括以下步骤:在基底上形成非晶硅薄膜;以及在非晶硅薄膜上形成非晶硅薄膜。通过使用掩模板对非晶硅薄膜进行激光退火处理以形成低温多晶硅薄膜,其中,所述掩模板包括透射区和围绕所述透射区的遮蔽区,并在其两侧。与透射区域相邻的遮蔽区域为凹凸形状。通过本申请中的低温多晶硅薄膜的制造方法形成的低温多晶硅薄膜的性能得到增强。

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