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GRADIENT-OPTICAL-INDEX POROUS (GRIP) COATINGS BY LAYER CO-DEPOSITION AND SACRIFICIAL MATERIAL REMOVAL

机译:通过层共沉积和去除特殊材料的梯度光学指数多孔(GRIP)涂层

摘要

The present invention provides a specific gradient-optical-index porous (GRIP) layer coating on inorganic optical substrate surfaces, and the fabrication method used to create the GRIP layer coating. The method consists of two major processing steps: (1) the co-deposition of an optical index-matching material and a mass density-modulating material, followed by (2) the sacrificial etch of the mass-density-modulating material to reveal a GRIP surface. The method is designed for use with crystalline, polycrystalline, and dry or wet etch-resistant substrate materials, where anti-reflective (AR) solutions using AR surface structures (ARSSs) do not exist. These coatings are designed to minimize Fresnel reflectivity of the original substrate surfaces, using a single porous layer matched to the optical index of the original substrate material.
机译:本发明提供了一种在无机光学基材表面上的特定的梯度光学折射率多孔(GRIP)层涂层,以及用于制造该GRIP层涂层的制造方法。该方法包括两个主要的处理步骤:(1)共沉积光学折射率匹配材料和质量密度调节材料,然后(2)牺牲蚀刻质量密度调节材料以显示出GRIP表面。该方法设计用于不具有使用AR表面结构(ARSSs)的抗反射(AR)溶液的晶体,多晶以及干或湿的抗蚀刻衬底材料。这些涂层设计为使用与原始基材材料的光学指数匹配的单个多孔层,以使原始基材表面的菲涅耳反射率最小化。

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