SLURRY FEED SYSTEM AND METHOD OF PROVIDING SLURRY TO CHEMICAL MECHANICAL PLANARIZATION STATION

摘要

Disclosed herein is a method of providing slurry to a chemical mechanical planarization (CMP) station. The method includes the operations of: mixing slurry, water and a chemical to form dilute slurry; measuring a surface tension of the dilute slurry; supplying the dilute slurry to a CMP station through piping; and modulating a flow rate of the dilute slurry in the piping in accordance with the measured surface tension.