MEASURING DEVICE FOR POINT DIFFRACTION INTERFEROMETRIC WAVEFRONT ABERRATION AND METHOD FOR DETECTING WAVE ABERRATION

摘要

A point diffraction interferometric wavefront aberration measuring device comprising an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. The center distance between the first output port and the second output port of the ideal wavefront generator is smaller than the diameter of the isoplanatic region of the measured optical system and is greater than the ratio of the diameter of the image point dispersion speckle of the measured optical system over the amplification factor thereof. A method for detecting wavefront aberration of the optical system is also provided by using the device.