首页> 外国专利> ALUMINUM-GALLIUM-INDIUM-PHOSPHORUS-BASED LIGHT EMITTING DIODE HAVING GALLIUM NITRIDE LAYER OF UNEVEN TYPE AND METHOD FOR MANUFACTURING SAME

ALUMINUM-GALLIUM-INDIUM-PHOSPHORUS-BASED LIGHT EMITTING DIODE HAVING GALLIUM NITRIDE LAYER OF UNEVEN TYPE AND METHOD FOR MANUFACTURING SAME

机译:具有不均匀类型的氮化镓层的铝镓铟磷基发光二极管及其制造方法

摘要

The present invention relates to a light emitting diode and a method for manufacturing same, and more specifically relates to growing a GaN layer of high quality on an upper part of an AlGaInP-based light emitting diode to improve the light extraction efficiency of the light emitting diode, wherein the GaN layer has a larger band gap and a smaller refractive index than AlGaInP-based material. The AlGaInP-based light emitting diode of the present invention is characterized by forming the GaN layer on the upper surface, and the GaN layer preferably has a surface of a fine uneven pattern. The GaN layer can be grown in the same system after forming the AlGaInP-based light emitting diode without an additional process.
机译:发光二极管及其制造方法技术领域本发明涉及一种发光二极管及其制造方法,并且更具体地涉及在AlGaInP基发光二极管的上部上生长高质量的GaN层以提高发光的光提取效率。二极管,其中,GaN层比基于AlGaInP的材料具有更大的带隙和更小的折射率。本发明的基于AlGaInP的发光二极管的特征在于在上表面上形成GaN层,并且GaN层优选具有精细的凹凸图案的表面。在形成基于AlGaInP的发光二极管之后,无需进行其他处理即可在同一系统中生长GaN层。

著录项

  • 公开/公告号US2016372633A1

    专利类型

  • 公开/公告日2016-12-22

    原文格式PDF

  • 申请/专利权人 AUK CORP;

    申请/专利号US201415114066

  • 发明设计人 HYUNG JOO LEE;IN KYU JANG;YOUNG JIN KIM;

    申请日2014-01-29

  • 分类号H01L33/32;H01L33/24;H01L33/46;H01L33/38;

  • 国家 US

  • 入库时间 2022-08-21 13:48:04

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