MICROARRAY PROCESSING APPARATUS, WELL PLATE FOR MICROARRAY PROCESSING APPARATUS, MICROARRAY HOLDER, AND MICROARRAY WASHING METHOD

摘要

Provided is a microarray processing apparatus which is capable of sufficiently washing a microarray. The microarray processing apparatus (30) includes a well plate (38) in which one or two or more wells (40) are formed, each well (40) accommodating a microarray (1), and a suction nozzle (46) that suctions a liquid from the well. The well has a concave portion whose upper end is opened, which has a depth equal to or greater than a height of the microarray, and into which a front end of the suction nozzle can be inserted up to a height position of a lower end of the microarray accommodated in the well. The suction nozzle can relatively descend in the well until the front end of the suction nozzle is located at the height position of the lower end of the microarray accommodated in the well.