Imprinting method and imprinting apparatus, sample shot extraction method, and article manufacturing method using same

摘要

Provided is an imprinting method that is capable of strictly performing the interpolation of the application distribution of an uncured resin material to be applied to a substrate for each shot as well as efficiently performing the reinterpolation of the application distribution of the uncured resin material for each shot while reducing the workload in a generation step. The imprinting apparatus of the present invention includes a mold 20 on which a mold pattern is formed; a mold driving unit 14 that allows the mold 20 move toward and away from a substrate 30; a dispenser 17 that applies an uncured resin material to the substrate 30; a light source 19 that cures the uncured resin material as a resin pattern; a dispenser control unit 43 that controls the dispenser 17 by generating the application distribution of the uncured resin material to the resin pattern for each of a plurality of shots; and a main control unit 40 that interpolates the application distribution of the uncured resin material, which has been generated by the dispenser control unit 43, using shot layout information in consideration of the relative position among the positions of a plurality of shots, the dispenser 17, and the light source 19 with respect to the substrate 30, as variables.