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MULTISCALE PATTERNING OF A SAMPLE WITH APPARATUS HAVING BOTH THERMO-OPTICAL LITHOGRAPHY CAPABILITY AND THERMAL SCANNING PROBE LITHOGRAPHY CAPABILITY
MULTISCALE PATTERNING OF A SAMPLE WITH APPARATUS HAVING BOTH THERMO-OPTICAL LITHOGRAPHY CAPABILITY AND THERMAL SCANNING PROBE LITHOGRAPHY CAPABILITY
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机译:同时具有热光光刻技术和热扫描探针光刻技术的设备的多尺度图案化
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摘要
The present invention provides a method for multiscale patterning of a sample. The method includes: placing the sample in an apparatus having both thermo-optical lithography capability and thermal scanning probe lithography capability; and patterning two patterns onto the sample, respectively by: thermo-optical lithography, wherein light is emitted from a light source onto the sample to heat the latter and thereby write a first pattern that is the largest of the two patterns; and thermal scanning probe lithography, wherein the sample and a heated probe tip are brought in contact for writing a second pattern that has substantially smaller critical dimensions than the first pattern. There is also provided an apparatus for multiscale patterning of a sample.
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