AN IMPROVED PROCESS FOR THE FABRICATION OF NANOPOROUS MICROSTRUCTURE ON GLASS AND A PRODUCTION PRODUCED THEREOF

摘要

The present invention describes an affordable, simple and very fast vapor phase etching method for achieving low reflecting surface on sodalime glass Both sides etched glass substrate showed a maximum transmittance of 96.8% at 598 nm, which is superior to the unetched glass substrate which has a transmittance of 91.6%. The etched glass substrate shows an average haze level of 4.2% and effective antireflective property over a wide range of incident angles. It was examined that a nanoporous structure was formed on etched glass substrate which acts as low refractive index layer and helps to reduce the reflection loss at air/glass interface. The robustness of etched surface was tested by means of simple outdoor test, freeze test, tape test, chemical and thermal stability test, which signifies its potential in various applications such as PV and solar thermal.