FILM-FORMING DEVICE, METHOD FOR MEASURING FILM THICKNESS OF ORGANIC FILM, AND FILM THICKNESS SENSOR FOR ORGANIC FILM

摘要

Provided are a film-forming device, a method for measuring the film thickness of an organic film, and a film thickness sensor for an organic film, with which it is possible to highly accurately control the film-forming rate and measure the film thickness of an organic film. The film-forming device (10) is provided with a vacuum chamber (11), an organic material source (12), a substrate holder (13), a film thickness sensor (14), and a measuring unit (17). The organic material source (12) is arranged inside the vacuum chamber (11) and is configured so as to be capable of releasing organic material particles. The substrate holder (13) is arranged so as to face the organic material source (12) and is configured so as to be capable of holding a substrate (W). The film thickness sensor (14) is arranged inside the vacuum chamber (11) and has a crystal oscillator having a fundamental frequency of 4 MHz or less. The measuring unit (17) measures the film thickness of an organic film deposited on the substrate (W) on the substrate holder (13) on the basis of changes in the resonance frequency of the crystal oscillator.