FILM-FORMING DEVICE METHOD FOR MEASURING FILM THICKNESS OF ORGANIC FILM AND FILM THICKNESS SENSOR FOR ORGANIC FILM

摘要

[PROBLEMS] To provide a film forming apparatus, a film thickness measuring method of an organic film, and a film thickness sensor for an organic film, which can control film formation rate and film thickness measurement of an organic film with high accuracy. A film forming apparatus (10) includes a vacuum chamber (11), an organic material source (12), a substrate holder (13), a film thickness sensor (14), and a measuring unit (17). The organic material source 12 is disposed inside the vacuum chamber 11 and is configured to be capable of emitting organic material particles. The substrate holder 13 is disposed opposite to the organic material source 12 and is configured to be able to hold the substrate W. [ The film thickness sensor 14 is disposed inside the vacuum chamber 11 and has a crystal oscillator having a fundamental frequency of 4 MHz or less. The measurement unit 17 measures the film thickness of the organic film deposited on the substrate W on the substrate holder 13, based on the change in the resonance frequency of the quartz crystal.