Deposition of graphene layers through chemical deposition in steam phase assisted by plasma (Machine-translation by Google Translate, not legally binding)

摘要

Deposition of graphene layers by chemical vapor deposition assisted by plasma. The invention relates to a process for deposition of high quality graphene layers on a substrate that is carried out by plasma-assisted chemical vapor deposition, said graphene layers comprising nanocrystals of controllable sizes with temperature and time interconnected by phase. Amorphous Furthermore, the invention relates to said material deposited on a substrate and its use as a component of windows or touch panels, protection systems, electrodes or a hard disk reader/plate. (Machine-translation by Google Translate, not legally binding)