首页> 外国专利> SILICON CARBIDE SINGLE CRYSTAL, SILICON CARBIDE SINGLE CRYSTAL WAFER, SILICON CARBIDE SINGLE CRYSTAL EPITAXIAL WAFER, ELECTRONIC DEVICE

SILICON CARBIDE SINGLE CRYSTAL, SILICON CARBIDE SINGLE CRYSTAL WAFER, SILICON CARBIDE SINGLE CRYSTAL EPITAXIAL WAFER, ELECTRONIC DEVICE

机译:碳化硅单晶硅片,碳化硅单晶硅片,碳化硅单晶硅片,电子设备

摘要

In this silicon carbide single crystal, a threading dislocation (20) is present, whereof the dislocation line (21) traverses the c-plane while the Burgers vector (bv) has at least a component in the c-axis direction. Among the threading dislocations, the density is 300/cm2 or less for the threading dislocations where the angle (θ1) formed by the Burgers vector and the direction of the dislocation line is greater than 0° and 40° or less, and the density is 30/cm2 or less for the threading dislocations where the angle is greater than 40°.
机译:在该碳化硅单晶中,存在贯穿位错(20),其位错线(21)横穿c面,而伯格斯向量(bv)在c轴方向上至少具有分量。在伯氏位错中,由伯格斯向量与位错线的方向所成的角度(θ1)大于0°且为40°的峰位的密度小于等于300 / cm 2 小于或等于°,对于角度大于40°的螺纹位错,密度等于或小于30 / cm 2

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