METHOD FOR ELECTROCHEMICAL POLISH IN CONSTANT VOLTAGE MODE

摘要

A method for electrochemical polish in constant voltage mode, comprising: presetting a constant current recipe with a current distribution which comprises multiple positions with different radius on a wafer and a predetermined current for each position; applying the constant current recipe to polish a first wafer; detecting and recording the voltage of each position during the polish; generating a constant voltage recipe with a voltage distribution which comprises the multiple positions and the recorded voltage of each position; and applying the constant voltage recipe to polish a second wafer.