首页>
外国专利>
METHOD FOR NANOMODULATING METAL FILMS BY MEANS OF HIGH-VACUUM CATHODE SPUTTERING OF METALS AND STENCILS
METHOD FOR NANOMODULATING METAL FILMS BY MEANS OF HIGH-VACUUM CATHODE SPUTTERING OF METALS AND STENCILS
展开▼
机译:通过金属和模板的高真空阴极溅射法对金属薄膜进行纳米调制的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention relates to a method for nanomodulating metal films by means of high-vacuum cathode sputtering of metals, and to stencils of anodised Al. As an example of the use of these nanomodulated metal films, the synthesis or production of a magnetically weak film by means of cathode sputtering, which film can be used as a magnetic field sensor, and a metal nanomodulated stencil are analysed.
展开▼