NON-AQUEOUS TUNGSTEN COMPATIBLE METAL NITRIDE SELECTIVE ETCHANTS AND CLEANERS

摘要

Provided therefore herein is a novel acidic fluoride activated cleaning chemistry. The present invention includes novel acidic fluoride-activated, unique organic-solvent based microelectronic selective etchant/cleaner compositions with high metal nitride etch and broad, excellent compatibility, including tungsten (W) and low-k. It does not use W-incompatible oxidizers, such as hydrogen peroxide or particle-generating corrosion inhibitors.