首页> 外国专利> BA3P3O10CL SINGLE CRYSTAL GROWTH METHOD AND CRYSTAL GROWTH DEVICE

BA3P3O10CL SINGLE CRYSTAL GROWTH METHOD AND CRYSTAL GROWTH DEVICE

机译:BA 3 P 3 O 10 CL单晶生长方法和晶体生长装置

摘要

A Ba3P3O10Cl single crystal growth method and a crystal growth device. The crystal growth device comprises: a furnace body (2), a furnace body holder (11) for holding the furnace body (2) and a hearth located within the furnace body (2), the hearth comprising a high temperature region located at the upper end thereof and a low temperature region located at the lower end thereof. A lifting device is provided on the furnace body holder (11) to control the rise and fall of a crucible bar (6) located within the hearth, and thus control the reciprocal motion of raw materials to be heated in the high temperature region and the low temperature region. A Ba3P3O10Cl single crystal of high quality and large size, which is able to meet the practical requirement of being at centimeter scale, is obtained from the method of the present invention, the size being about Φ10×50mm, and the transmittance in the ultraviolet-visible area being able to reach 90% or more. The crystal growth device has a novel and simple structure, and therefore cannot only be suitable for the growth of the Ba3P3O10Cl single crystal but also be suitable for the crystal growth of a series of compounds that are easily oxidized, melt unevenly, or of which the decomposition temperature is lower than the melting point, and thus has broad application value.
机译:Ba 3 P 3 O 10 Cl单晶生长方法和晶体生长装置。该晶体生长装置包括:炉体(2),用于保持炉体(2)的炉体保持器(11)和位于炉体(2)内的炉床,炉床包括位于炉口处的高温区域。其上端和位于其下端的低温区域。在炉体支架(11)上设置有升降装置,以控制位于炉床内的坩埚棒(6)的上升和下降,从而控制要加热的原料在高温区域和炉膛内的往复运动。低温区域。高质量,大尺寸的Ba 3 P 3 O 10 Cl单晶,能够满足厘米级的实际要求通过本发明的方法获得的氧化硅鳞片的尺寸约为Φ10×50mm,并且在紫外可见区域的透射率能够达到90%以上。该晶体生长装置结构新颖简单,因此不仅适合于Ba 3 P 3 O 10 Cl的生长。单晶,但也适用于易于氧化,不均匀熔化或分解温度低于熔点的一系列化合物的晶体生长,因此具有广泛的应用价值。

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