METHOD TO MANUFACTURE SCRUBBER FOR DISPOSAL OF SEMICONDUCTOR WASTE GAS, SCRUBBER THEREOF, AND METHOD TO PREVENT CORROSION AND OXIDE ATTACHMENT BY USING SCRUBBER

摘要

Disclosed are a method to manufacture a scrubber for the disposal of semiconductor waste gas, a scrubber thereof, and a method to prevent corrosion and oxide attachment by using the scrubber. According to an embodiment of the present invention, the method to manufacture a scrubber, including a liner formed on the inner surface of a reaction chamber, comprises: a first step of forming a coating layer on the inner surface of the liner by spraying an inorganic ceramic coating material under atmospheric pressure at a normal temperature; a second step of processing a purge hole in the liner coated in the first step; a third step of thermally treating the surface of the liner, including the coating layer, at 200-300°C; and a fourth step of measuring the thickness of the coating layer and the purge hole of the liner thermally treated. The inorganic ceramic coating material is a graphene material. The liner is formed to have a predetermined gap with the inner surface of the reaction chamber. Therefore, the present invention is capable of preventing corrosion and process oxide attachment at the same time and having excellent durability even in a high temperature environment by preventing an oxide from being attached to the purge hole and the surface of the liner of the scrubber.;COPYRIGHT KIPO 2016