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METHOD FOR MANUFACTURING THIN FILM WITH THREE-DIMENSIONAL NANOPOROUS STRUCTURE BY USING BAFFLE AND THIN FILM WITH THREE-DIMENSIOANAL NANOPOROUS STRUCTURE MANUFACTURED BY SAME
METHOD FOR MANUFACTURING THIN FILM WITH THREE-DIMENSIONAL NANOPOROUS STRUCTURE BY USING BAFFLE AND THIN FILM WITH THREE-DIMENSIOANAL NANOPOROUS STRUCTURE MANUFACTURED BY SAME
According to an embodiment of the present invention, a manufacturing method for forming a thin film with a three-dimensional nanoporous structure on a substrate made of various materials with low thermal conductivity uses a baffle during thermal deposition. According to the present invention, the method for manufacturing a thin film with a three-dimensional nanoporous structure comprises the following steps: fixating the substrate in a deposition chamber and installing the baffle with a function of thermal insulation in a predetermined location between the substrate and a heat source; generating a vacuum state in the deposition chamber; injecting process gas into the deposition chamber in a vacuum state to allow the process gas to generate initial phase process pressure; setting a temperature of the substrate to be 50or lower; generating vapor of a deposition material by increasing the temperature of the heat source containing the deposition material as a thermal deposition process; and allowing deposition particles, generated in step (v), to be deposited on the substrate.;COPYRIGHT KIPO 2017
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