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2D Photodetector using bandgap-engineered 2D materials and method of manufacturing the same

机译:使用带隙工程的2D材料的2D光电探测器及其制造方法

摘要

Disclosed are a photodetector for inserting a barrier layer having a bandgap larger than a light absorption layer between a graphene layer and a light absorption layer to reduce the flow of dark current that may occur before light is incident on a photodetector, and a manufacturing method thereof. The disclosed photodetector includes: a substrate; an insulating layer formed on the substrate; a first graphene layer formed on the insulating layer; a 2D material layer formed on the first graphene layer; a second graphene layer formed on the 2D material layer; a first electrode formed on the first graphene layer; and a second electrode formed on the second graphene layer, wherein the 2D material layer includes a barrier layer and a light absorbing layer, and the barrier layer has a band gap larger than that of the light absorbing layer.
机译:公开了一种用于在石墨烯层和光吸收层之间插入具有比光吸收层的带隙大的带隙的阻挡层以减少在光入射到光检测器上之前可能发生的暗电流的流动的光检测器及其制造方法。 。公开的光电探测器包括:基板;在基板上形成的绝缘层;在绝缘层上形成的第一石墨烯层;在第一石墨烯层上形成的2D材料层;在2D材料层上形成的第二石墨烯层;在第一石墨烯层上形成的第一电极;在第二石墨烯层上形成第二电极,其中2D材料层包括阻挡层和光吸收层,并且该阻挡层的带隙大于光吸收层的带隙。

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