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PROTECTIVE-FILM-ATTACHED FILM ON WHICH TRANSPARENT CONDUCTIVE FILM IS TO BE LAMINATED AND METHOD OF MANUFACTURING TRANSPARENT CONDUCTIVE FILM
PROTECTIVE-FILM-ATTACHED FILM ON WHICH TRANSPARENT CONDUCTIVE FILM IS TO BE LAMINATED AND METHOD OF MANUFACTURING TRANSPARENT CONDUCTIVE FILM
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机译:需层压透明导电膜上的保护膜的膜及其制造方法
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摘要
The object of the present invention is to provide a film for laminating a transparent conductive layer with a protective film (1a, 1b) having excellent anti-smudge properties. The film for laminating a transparent conductive layer with a protective film (1a, 1b) comprises a film for laminating a transparent conductive layer (3a, 3b) and a protective film (2). The film for laminating a transparent conductive layer (3a, 3b) is provided with a support (31) and a first functional layer (32), and the protective film (2) is provided with a substrate (22), an adhesive layer (23), and a coat layer (21). A resistance value of the surface opposite to the substrate (22) of the coat layer (21) is 1.0 x 10^12 /cm^2 or less, and free energy of the surface opposite to the substrate (22) of the coat layer (21) is 45 mJ/m^2 or less. An arithmetic average roughness value (Ra) of at least one of the surface opposite to the substrate (22) of the coat layer (21) and the surface opposite to the support (31) of the first functional layer (32) is 7 nm or more.
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机译:本发明的目的是提供一种用于将透明导电层与具有优异的防污性的保护膜(1a,1b)层压的膜。用于将透明导电层与保护膜层叠的膜(1a,1b)包括用于层叠透明导电层(3a,3b)的膜和保护膜(2)。用于层叠透明导电层(3a,3b)的膜设置有支撑体(31)和第一功能层(32),并且保护膜(2)设置有基板(22),粘合层( 23)和涂层(21)。涂层(21)的与基材(22)相对的表面的电阻值为1.0×10 ^ 12 / cm ^ 2或更小,并且涂层(21)的与基材(22)相对的表面的自由能(21)为45 mJ / m ^ 2或更小。涂层(21)的与基板(22)相对的表面和第一功能层(32)的与支撑体(31)相对的表面中的至少一个的算术平均粗糙度值(Ra)为7nm。或者更多。
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