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PROTECTIVE-FILM-ATTACHED FILM ON WHICH TRANSPARENT CONDUCTIVE FILM IS TO BE LAMINATED AND METHOD OF MANUFACTURING TRANSPARENT CONDUCTIVE FILM
PROTECTIVE-FILM-ATTACHED FILM ON WHICH TRANSPARENT CONDUCTIVE FILM IS TO BE LAMINATED AND METHOD OF MANUFACTURING TRANSPARENT CONDUCTIVE FILM
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机译:需层压透明导电膜上的保护膜的膜及其制造方法
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摘要
The object of the present invention is to provide a film for laminating a transparent conductive layer with a protective film (1a, 1b), having excellent anti-smudge properties which can be maintained even when the surface is scratched. The film for laminating a transparent conductive layer with the protective film (1a, 1b) comprises a film for laminating a transparent conductive layer (3a, 3b) and a protective film (2). The film for laminating the transparent conductive layer (3a, 3b) is provided with a support (31) and a first functional layer (32), and the protective film (2) is provided with a substrate (22), an adhesive layer (23), and a coat layer (21). A resistance value of the surface opposite to the substrate (22) of the coat layer (21) is 1.0 x 10^12 /cm^2 or less, and a resistance value of the surface after being polished under a predetermined condition is 1.0 x 10^12 /cm^2 or less. An arithmetic average roughness value (Ra) of at least one of the surface opposite to the surface mentioned above and the surface opposite to the support (31) of the first functional layer (32) is 7 nm or more.
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机译:本发明的目的是提供一种用于透明导电层与保护膜(1a,1b)层压的膜,该膜具有优异的防污性能,即使刮擦表面也可以保持这种性能。用于将透明导电层与保护膜(1a,1b)层压的膜包括用于层压透明导电层(3a,3b)的膜和保护膜(2)。用于层叠透明导电层(3a,3b)的膜设置有支撑体(31)和第一功能层(32),并且保护膜(2)设置有基板(22),粘合层( 23)和涂层(21)。涂层(21)的与基板(22)相对的表面的电阻值为1.0×10 ^ 12 / cm ^ 2以下,并且在预定条件下抛光后的表面的电阻值为1.0×10 ^ 12 / cm ^ 2。 10 ^ 12 / cm ^ 2以下。第一功能层(32)的与上述表面相反的表面和与支撑体(31)相反的表面中的至少一个的算术平均粗糙度值(Ra)为7nm以上。
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