A holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber, an apparatus for depositing a layer on a substrate, and a method for aligning a mask carrier with a substrate carrier supporting the substrate

摘要

The present disclosure provides a holding arrangement 100 for supporting a substrate carrier 130 and a mask carrier 140 during layer deposition in a processing chamber. The holding arrangement 100 includes two or more alignment actuators connectable to at least one of the substrate carrier 130 and the mask carrier 140, wherein the holding arrangement 100 comprises a plurality of alignment actuators, Wherein the first alignment actuator 110 of the two or more alignment actuators is configured to support the substrate carrier 130 in parallel relative to the substrate carrier 130 in at least a first direction 1, Wherein the second alignment actuator 120 of the two or more alignment actuators is configured to move the mask carrier 130 and the mask carrier 140 relative to each other in at least a first direction 1, Is configured to move the substrate carrier (130) and the mask carrier (140) relative to each other in a second direction (2) different from the first direction (1) (2) is in the first plane.