COMPONENTS SUCH AS EDGE RINGS INCLUDING CHEMICAL VAPOR DEPOSITION (CVD) DIAMOND COATING WITH HIGH PURITY SP3 BONDS FOR PLASMA PROCESSING SYSTEMS

摘要

The present invention relates to components such as edge rings including chemical vapor deposition (CVD) diamond coating with high purity SP3 bonds for plasma processing systems. A pedestal for a plasma processing system includes a substrate support surface. An annular edge ring is disposed around a substrate support surface. A CVD diamond coating is disposed on a plasma-exposed surface of the annular ring. The CVD diamond coating includes sp3 bonds. The purity of the sp3 bonds in the diamond coating is greater than 90%.;COPYRIGHT KIPO 2017