ALD/CVD - ORGANOSILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM APPLICATIONS AND METHODS OF USING THE SAME

摘要

Organosilane precursors, methods for their synthesis, and methods for their use in depositing silicon-containing films using a deposition process are disclosed. Disclosed organosilane precursor has the formula _{SiH x (RN- (CR) n} -NR) y (NRR) having a _z, in which R is independently H, C ₁ to C ₆ alkyl group, or a C ₃ -C ₂₀ each X + y + z = 4, and n, x, y, and z are integers, with the proviso that when y = 1, x? Preferably, n = 1 to 3, x = 0 to 2, y = 1 or 2, and z = 1 to 3.