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Comparison between aluminum oxide surface passivation films deposited with thermal ALD, plasma ALD and PECVD

机译：用热ALD，等离子体ALD和PECVD沉积铝氧化铝表面钝化膜的比较

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G. Dingemans; P. Engelhart; R. Seguin; M.M. Mandoc; M. C. M. van de Sanden; W.M.M. Kessels;
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年度 2010
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1. Enhanced field effect passivation of c-Si surface via introduction of trap centers: Case of hafnium and aluminium oxide bilayer films deposited by thermal ALD [J] . Panigrahi Jagannath, Vandana, Singh Rajbir, Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion . 2018,第期

机译：通过引入陷阱中心增强C-Si表面的现场效应钝化：热ALD沉积的铪和氧化铝双层膜的情况
2. Effect of low thermal budget annealing on surface passivation of silicon by ALD based aluminum oxide films [J] . Vandana, Neha Batra, Jhuma Gope Physical chemistry chemical physics: PCCP . 2014,第39期

机译：低热预算退火对基于ALD基氧化铝膜表面钝化的影响
3. Investigation of c-Si surface passivation using thermal ALD deposited HfO2 films [J] . Gougam Adel B., Rajab Bilal, Bin Afif Abdulla Materials science in semiconductor processing . 2019,第期

机译：使用热ALD沉积HFO2薄膜对C-Si表面钝化的研究
4. Comparison between aluminum oxide surface passivation films deposited with thermal ALD, plasma ALD and PECVD [C] . Dingemans G., Engelhart P., Seguin R., 35th IEEE Photovoltaic Specialists Conference . 2010

机译：热ALD，等离子ALD和PECVD沉积的氧化铝表面钝化膜的比较
5. Electrical, chemical and thermal behavior of deposited silicon oxides: A comparison between PECVD, ECR and sputtered films. [D] . Kalpathy, Jayashree Krishna. 1993

机译：沉积的氧化硅的电，化学和热行为：PECVD，ECR和溅射膜之间的比较。
6. Aluminum Oxide Nanoparticle Films Deposited from aNonthermal Plasma: Synthesis Characterization and Crystallization [O] . Zhaohan Li, Parker R. Wray, Magel P. Su, 2020

机译：氧化铝纳米粒子薄膜沉积非热血浆：合成表征和结晶
7. Effect of low thermal budget annealing on surface passivation of silicon by ALD based aluminum oxide films [O] . Vandana Vandana, Neha Batra, Jhuma Gope, 2014

机译：低热预算退火对基于ALD基氧化铝膜表面钝化的影响

Comparison between aluminum oxide surface passivation films deposited with thermal ALD, plasma ALD and PECVD

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