首页> 外国专利> COPLANAR HIGH FILL FACTOR PIXEL ARCHITECTURE

COPLANAR HIGH FILL FACTOR PIXEL ARCHITECTURE

机译:共平面高填充因子像素体系结构

摘要

A pixel according to the present invention includes a scan line adjacent a first surface of a substrate and a bias line positioned between the first surface of the substrate and the first terminal of the photoelectric conversion element and substantially parallel to the scan line. The pixel also includes a switching element adjacent to the first surface of the substrate and aligned with at least a portion of the scan line. The pixel includes a photoelectric conversion element adjacent to the first surface of the substrate and aligned with at least a portion of the bias line.
机译:根据本发明的像素包括与基板的第一表面相邻的扫描线和位于基板的第一表面与光电转换元件的第一端子之间并且基本平行于扫描线的偏置线。像素还包括与基板的第一表面相邻并且与扫描线的至少一部分对准的开关元件。像素包括与衬底的第一表面相邻并且与偏置线的至少一部分对准的光电转换元件。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号