Apparatus and method for preventing marking position change of wafer in wafer marking process using laser and wafer marking apparatus and method using laser

摘要

An apparatus and method for preventing marking position variations in a wafer in a wafer marking process using a laser, and a wafer marking apparatus and method using a laser are disclosed. An apparatus for preventing a marking position variation of a disclosed wafer includes a wafer holder including a holder insertion portion on which the wafer is placed and having a target pattern of a predetermined shape formed thereon, And a camera mounted on the stage and measuring a position of the wafer and a position of the target pattern.;