首页> 外国专利> METHOD OF CONTROLLING THE ELECTRONIC STRUCTURE OF TWO-DIMENSIONAL MATERIALS VIA PLASMA ADSORPTION AND DESORPTION

METHOD OF CONTROLLING THE ELECTRONIC STRUCTURE OF TWO-DIMENSIONAL MATERIALS VIA PLASMA ADSORPTION AND DESORPTION

机译:通过等离子体吸附和脱附控制二维材料的电子结构的方法

摘要

The present invention provides a method of controlling the electronic structure of a two-dimensional material. The method includes a step of performing plasma adsorption on a two-dimensional material by using halogen element or oxygen; and a step of performing plasma treatment on the two-dimensional material by using hydrogen to combine hydrogen with the halogen element or oxygen to form a compound and desorbing the halogen element or oxygen from the surface of the two-dimensional material. So, the electronic structure of the two-dimensional material can be reversibly controlled.
机译:本发明提供一种控制二维材料的电子结构的方法。该方法包括通过使用卤素元素或氧气在二维材料上进行等离子体吸附的步骤;通过使用氢使氢与卤素元素或氧结合以形成化合物并从二维材料的表面解吸卤素元素来对二维材料进行等离子体处理的步骤。因此,可以可逆地控制二维材料的电子结构。

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