首页> 外国专利> METHOD FOR PREPARING SILICON NANOPOWDER AND RF HEAT PLASMA APPARATUS FOR PREPARING SILICON NANOPOWDER

METHOD FOR PREPARING SILICON NANOPOWDER AND RF HEAT PLASMA APPARATUS FOR PREPARING SILICON NANOPOWDER

机译:制备硅纳米粉的方法和制备硅纳米粉的射频热等离子体装置

摘要

The present invention relates to a method for preparing silicon nanopowder with a selected particle size under the optimized conditions of location and flow of cooling gas injection, and a RF heat plasma apparatus for preparing silicon nanopowder. The method for preparing silicon nanopowder comprises the steps of: 1) supplying a RF heat plasma-generating gas to a RF heat plasma apparatus to generate RF heat plasma; 2) injecting a cooling gas through a cooling device in the direction opposite to the direction of injecting the RF heat plasma-generating gas in step 1); and 3) supplying silicon powder to the RF heat plasma generated in step 1) to carry out vaporization and cooling. In addition, the RF heat plasma apparatus for preparing silicon nanopowder comprises: a torch for generating heat plasma; a reactor extended in the direction of flow of the heat plasma generated from the torch; a feed supplying device for injecting silicon powder to the heat plasma; and a cooling device for injecting a cooling gas in the direction opposite to the direction of injecting the plasma-generating gas.;COPYRIGHT KIPO 2017
机译:本发明涉及在冷却气体注入的位置和流量的最佳条件下制备具有选定粒径的硅纳米粉的方法,以及用于制备硅纳米粉的RF热等离子体装置。制备硅纳米粉的方法包括以下步骤:1)将产生RF热等离子体的气体供应到RF热等离子体装置以产生RF热等离子体。 2)以与步骤1)中注入RF热等离子体产生气体的方向相反的方向通过冷却装置注入冷却气体; 3)向步骤1)中产生的RF热等离子体提供硅粉,以进行汽化和冷却。另外,用于制备硅纳米粉的RF热等离子体装置包括:产生热等离子体的焊炬;以及用于产生热等离子体的焊炬。在从焊炬产生的热等离子体的流动方向上延伸的反应器;用于将硅粉注入热等离子体的进料供给装置; COPYRIGHT KIPO 2017;以及一种沿与注入等离子体产生气体的方向相反的方向注入冷却气体的冷却装置。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号