AN IMMERSION LITHOGRAPHY APPARATUS AND A CLEANING METHOD USED IN AN IMMERSION LITHOGRAPHY APPARATUS

摘要

An immersion lithographic apparatus includes a reticle stage arranged to hold a reticle, a working stage arranged to hold a workpiece, and an optical system that includes an illumination source and an optical system that opposes a workpiece having an image pattern of a reticle projected by the radiation from the illumination source, And an optical system including a device. The gap is defined between the optical element and the workpiece and functions to supply an immersion liquid to the gap such that the immersion liquid supplied contacts the immersion liquid to contact both the optical element and the workpiece during the immersion lithography process. A cleaning device is included for removing the liquid absorbed from the optical element during the cleaning process. The cleaning device utilizes a cleaning liquid having an affinity for cavitating bubbles to remove the absorbed liquid, heat, vacuum, ultrasonic vibration or the absorbed liquid. The rinse liquid may be supplied through the same fluid application device provided with a switching device such as a valve.;