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Crucible for metal thin film deposition and evaporation source having the same
Crucible for metal thin film deposition and evaporation source having the same
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机译:用于金属薄膜沉积的坩埚和具有该坩埚的蒸发源
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摘要
According to an aspect of the present invention, there is provided a metal thin film deposition crucible for forming a metal thin film on a substrate while containing a vaporization material of metal and being melted and melted by heating to form a metal thin film deposition crucible, And a step portion extending inward from the inner wall of the body portion so as to form a first molten hole in a depth direction at the center of the body portion, wherein the plurality of first molten holes are concentrically formed around the first molten hole There is provided a metal thin film deposition crucible in which a second molten hole is formed.
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