3 Method of generating 3-Dimension Process Window Qualification

摘要

In order to generate a three-dimensional process window condition, a photoresist film is first coated on a substrate on which a substructure is formed, and the substrate is divided into a plurality of concentric regions so as to be divided over an edge and a central portion of the substrate. And a common exposure condition containing exposure range is set for each of the regions. And each of the shot regions in the regions is exposed in a divided exposure condition within the exposure range to form a photoresist pattern. The photoresist pattern is inspected to select a normal photoresist pattern for each region to generate a three-dimensional process window condition. According to this method, precise process window conditions can be generated in which the substrate substructure characteristics are taken into account.;