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Manufacturing plant for the production of integrated circuits from semiconductor wafers and waffle element for a manufacturing plant

机译:用于从半导体晶片和华夫饼元件生产集成电路的制造工厂,用于制造工厂

摘要

The manufacturing plant is used to fabricate integrated circuits on semiconductor wafers and has at least one radiation generator that generates EUV radiation. It is fed to at least one lithography machine for exposing the wafers. The lithography machine is housed in a factory building. The radiation generator is located in a separate building or building section from the factory building. The EUV radiation is supplied to the factory building via at least one beam guide. From the beam guide branches off at an obtuse angle at least one supply line, is supplied via the at least part of the EUV radiation of the lithographic machine. The waffle element has at least one passage which has a rectangular outline and encloses an acute angle with a median plane of the waffle element, viewed in plan view of the waffle element. The production facility and the waffle element enable a cost-effective and simple design of the supply of EUV radiation to the lithographic machine.
机译:该制造工厂用于在半导体晶圆上制造集成电路,并具有至少一个产生EUV辐射的辐射发生器。它被送入至少一台光刻机以曝光晶片。光刻机位于工厂厂房中。辐射发生器位于与工厂建筑物不同的建筑物或建筑物区域中。 EUV辐射通过至少一个光束导向器提供给工厂建筑物。经由光刻机的EUV辐射的至少一部分从光束引导器以钝角分支出至少一条供应线。松饼元件具有至少一个通道,该通道具有矩形轮廓并且与松饼元件的中间平面围成锐角,当从松饼元件的平面图中观察时。该生产设施和华夫格元件使向光刻机提供EUV辐射的成本效益高且设计简单。

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