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Crucible with an inner coating of SiC as a diffusion barrier for metals and process for its preparation, use and semiconductor crystals produced therein

机译:具有SiC内涂层作为金属扩散阻挡层的坩埚及其制备,使用和生产半导体晶体的工艺

摘要

The invention relates to a method for coating a crucible, wherein the coating represents a diffusion barrier for metal atoms. By applying a coating by the method according to the invention, it is possible to minimize the metallic impurity content of the semiconductor crystals produced in the crucible. Furthermore, the invention relates to a crucible produced by this method with an inner coating and its fields of application. The semiconductor crystals produced in the crucible are of particularly high quality and purity, since the total contamination in the crystal volume is reduced and the very heavily contaminated edge regions are reduced. Silicon blocks produced in this way are of particular interest to the photovoltaic industry.
机译:本发明涉及涂覆坩埚的方法,其中该涂层代表金属原子的扩散阻挡层。通过根据本发明的方法施加涂层,可以最小化在坩埚中产生的半导体晶体的金属杂质含量。此外,本发明涉及通过这种方法生产的具有内涂层的坩埚及其应用领域。在坩埚中生产的半导体晶体具有特别高的质量和纯度,因为减少了晶体体积中的总污染并且减少了严重污染的边缘区域。以这种方式生产的硅块对于光伏产业特别重要。

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