Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device

摘要

The method involves printing (100) a set of calibration patterns, and measuring (120) characteristic dimensions of the patterns after printing the dimensions in memory. A point spread function characterizing diffused electrons is estimated (140), and patterns to be provided are estimated by convolution of the function. The estimation is calculated (160) as sum of portions of point spread function characterizing electrons retro-diffused by the substrate and diffused in the resin. Analytical modelization of application effect of one of the portions to the patterns is inserted on the dimensions. An independent claim is also included for a device for printing patterns on a plate or on a mask by electron beam lithography.