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CORNER ROUNDING CORRECTION FOR ELECTRON BEAM (EBEAM) DIRECT WRITE SYSTEM
CORNER ROUNDING CORRECTION FOR ELECTRON BEAM (EBEAM) DIRECT WRITE SYSTEM
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机译:电子束(EBEAM)直接写入系统的角部校正
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摘要
Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction, each of the openings of the first column of openings having dog-eared corners. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings, each of the openings of the second column of openings having dog-eared corners. The first and second columns of openings together form an array having a pitch in the first direction. A scan direction of the BAA is along a second direction, orthogonal to the first direction. The pitch of the array corresponds to half of a minimal pitch layout of a target pattern of lines for orientation parallel with the second direction.
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