DEPOSITION OF GRAPHENE LAYERS BY MEANS OF PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITION

摘要

The invention relates to a method for depositing high-quality graphene layers on a substrate by means of plasma-enhanced chemical vapour deposition, said graphene layers comprising nanocrystals of sizes that can be controlled with temperature and time and which are interconnected by amorphous phase. The invention also relates to said material deposited on a substrate and the use thereof as a component in touch panels or touch windows, protection systems, electrodes, hard disc read heads/platters, as a resistant coating, and as a component of a resistance heater.