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VOID STRUCTURED FILM BONDED THROUGH CATALYTIC ACTION AND METHOD FOR MANUFACTURING SAME

机译:通过催化作用结合的空泡结构膜及其制造方法

摘要

The present invention provides, for example, a film with void spaces having a porous structure with less cracks and a high proportion of void space as well as having a strength. The film with void spaces of the present invention includes one kind or two or more kinds of structural units that form a structure with minute void spaces, wherein the structural units are chemically bonded through catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The film with void spaces can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.
机译:本发明提供例如具有空隙的膜,该膜具有多孔结构,该结构具有较少的裂缝和较高比例的空隙,并且具有强度。本发明的具有空隙的膜包括形成具有微小空隙的结构的一种或两种以上的结构单元,其中这些结构单元通过催化化学键合。例如,使用BEMCOT®测量的耐磨性在60%到100%的范围内,而通过MIT测试测量的耐折性是100倍以上。具有空隙的膜例如可以通过以下方法来制造:使用含有溶胶的凝胶状硅化合物的粉碎物形成有机硅多孔体的前体,然后使有机硅多孔体的前体中包含的粉碎体化学键合。粉碎产物之间的化学键优选为例如粉碎产物之间的化学交联键。

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