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CULTURE APPARATUS, CULTURE VESSEL, AND OPTIMIZATION METHOD OF GAS SUPPLY CONDITIONS TO CULTURE VESSEL

机译:培养装置,培养皿以及培养皿的供气条件的最优化方法

摘要

PROBLEM TO BE SOLVED: To provide a culture apparatus that performs gas supply into a culture vessel, senses a physical property value of culture solution based on the gas, and controls gas supply, and is capable of suppressing generation of large distribution in the concentration or the like of a gas composition supplied to culture solution in the culture vessel.;SOLUTION: A culture apparatus comprises: a culture bag 13; a plurality of sensors 15a to 15c which are provided corresponding to each region in the culture bag 13 and measures a specific component in culture solution; gas supply means 131a to 131c (including 14a to 14c and 134a to 134c) which supply gas which adjusts a specific component in culture solution corresponding to each region in the culture bag 13; and a control part 111 which controls gas supply from the gas supply means 131a to 131c corresponding to each region on the basis of information detected by the sensors 15a to 15c corresponding to each region.;SELECTED DRAWING: Figure 6;COPYRIGHT: (C)2019,JPO&INPIT
机译:解决的问题:提供一种培养装置,其向培养容器中进行气体供给,基于该气体来感测培养液的物性值,并控制气体的供给,并且能够抑制浓度或浓度的大的分布的产生。解决方案:一种培养装置包括:培养袋13;和培养袋13。多个传感器15a至15c,它们对应于培养袋13中的每个区域设置,并测量培养液中的特定成分。气体供应装置131a至131c(包括14a至14c和134a至134c)供应气体,该气体调节与培养袋13中的每个区域相对应的培养液中的特定成分;控制部111根据各区域的传感器15a〜15c所检测出的信息,控制从各区域的气体供给机构131a〜131c的气体供给。图6;版权:(C) 2019年,JPO&INPIT

著录项

  • 公开/公告号JP2018170977A

    专利类型

  • 公开/公告日2018-11-08

    原文格式PDF

  • 申请/专利权人 ABLE CORP;

    申请/专利号JP20170070292

  • 发明设计人 ISHIKAWA SHUTARO;

    申请日2017-03-31

  • 分类号C12M1/00;C12N1/00;C12M1/04;C12M1/02;

  • 国家 JP

  • 入库时间 2022-08-21 13:13:31

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