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ANNULAR FILM FORMATION METHOD, ANNULAR FILM FORMATION TOOL, AND ANNULAR FILM FORMATION MASK

机译:环形膜形成方法,环形膜形成工具和环形膜形成掩模

摘要

PROBLEM TO BE SOLVED: To form an annular thin film on a film formation object.;SOLUTION: Masks (21 to 24) having a magnetic material or a magnet at least partially are disposed on one face of film formation objects (11 to 14). At the same time, magnets or magnetic bodies (31 to 34) that act with the magnetic material or the magnet of the masks (21 to 24) are disposed in the vicinity of the other face of film formation objects (11 to 14) and the masks (21 to 24) are made to come in contact with the film formation objects (11 to 14). Under such a state, a film formation material is deposited on aside of a face where the masks (21 to 24) of the film formation objects (11 to 14) are provided.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2018,JPO&INPIT
机译:解决的问题:在成膜物体上形成环形薄膜。解决方案:具有至少一部分磁性材料或磁体的掩模(21至24)设置在成膜物体(11至14)的一个面上。 。同时,与磁性材料或掩模(21至24)的磁体作用的磁体或磁体(31至34)被设置在成膜对象(11至14)的另一面附近。使掩模(21〜24)与成膜体(11〜14)接触。在这种状态下,将成膜材料沉积在设置有成膜物体(11至14)的掩膜(21至24)的一面的侧面上;选图:图1;版权:(C)2018 ,JPO&INPIT

著录项

  • 公开/公告号JP2018066987A

    专利类型

  • 公开/公告日2018-04-26

    原文格式PDF

  • 申请/专利权人 SHOWA SHINKU CO LTD;

    申请/专利号JP20170199737

  • 发明设计人 YANASE KENSUKE;ARAKAWA TOSHIAKI;

    申请日2017-10-13

  • 分类号G02B5/00;C23C14/04;G02B7/02;

  • 国家 JP

  • 入库时间 2022-08-21 13:11:52

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