Monolithic gas distribution manifold and its various construction techniques and applications

摘要

A gas supply substrate for mounting a gas supply component of a gas supply system for a semiconductor processing apparatus is provided. The substrates are bonded together to form a major surface that forms a laminate with openings for receiving and attaching the first, second, third, and fourth gas supply components to the outer major surface. You may have multiple layers with it. The substrate may comprise a first gas channel extending to an inner major surface, the first gas channel overlapping at least partially with a second gas channel extending to a different inner major surface. The substrate includes a first gas conduit including a first gas channel connecting the first gas supply component to the second gas supply component, and a second connecting the third gas supply component to the fourth gas supply component. And a second gas conduit including a gas channel. Various techniques for manufacturing a gas supply substrate are also disclosed. [Selection] Figure 11