首页> 外国专利> Nitride semiconductor laminate, method for producing nitride semiconductor laminate, method for producing semiconductor laminate, and method for inspecting semiconductor laminate

Nitride semiconductor laminate, method for producing nitride semiconductor laminate, method for producing semiconductor laminate, and method for inspecting semiconductor laminate

机译:氮化物半导体层叠体,氮化物半导体层叠体的制造方法,半导体层叠体的制造方法以及半导体层叠体的检查方法

摘要

There is provided a nitride semiconductor laminate, including: a substrate; an electron transit layer provided on the substrate and containing a group III nitride semiconductor; and an electron supply layer provided on the electron transit layer and containing a group III nitride semiconductor, wherein a surface force A of the electron supply layer acting as an attractive force for attracting a probe and a surface of the electron supply layer when measured using the probe consisting of a glass sphere with a diameter of 1 mm covered with Cr, is stronger than a surface force B of Pt when measured under the same condition, and an absolute value | A - B | of a difference between them is 30 µN or more.
机译:提供了一种氮化物半导体层压板,包括:基材;电子传输层,其设置在基板上并包含III族氮化物半导体;以及设置在电子传输层上并包含III族氮化物半导体的电子供应层,其中当使用所述电子供应层进行测量时,所述电子供应层的表面力A充当用于吸引探针的吸引力和所述电子供应层的表面。在相同条件下测量时,由直径1 mm的玻璃球覆盖Cr构成的探头比Pt的表面力B强。 A-B |它们之间的差异为30 µN或更大。

著录项

  • 公开/公告号JP6268229B2

    专利类型

  • 公开/公告日2018-01-24

    原文格式PDF

  • 申请/专利号JP20160126579

  • 发明设计人 堀切 文正;

    申请日2016-06-27

  • 分类号H01L21/338;H01L29/778;H01L29/812;H01L21/205;H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 13:07:45

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