首页>
外国专利>
Nitride semiconductor laminate, method for producing nitride semiconductor laminate, method for producing semiconductor laminate, and method for inspecting semiconductor laminate
Nitride semiconductor laminate, method for producing nitride semiconductor laminate, method for producing semiconductor laminate, and method for inspecting semiconductor laminate
There is provided a nitride semiconductor laminate, including: a substrate; an electron transit layer provided on the substrate and containing a group III nitride semiconductor; and an electron supply layer provided on the electron transit layer and containing a group III nitride semiconductor, wherein a surface force A of the electron supply layer acting as an attractive force for attracting a probe and a surface of the electron supply layer when measured using the probe consisting of a glass sphere with a diameter of 1 mm covered with Cr, is stronger than a surface force B of Pt when measured under the same condition, and an absolute value | A - B | of a difference between them is 30 µN or more.
展开▼