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Method for manufacturing pellicle and method for manufacturing photomask with pellicle
Method for manufacturing pellicle and method for manufacturing photomask with pellicle
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机译:防护薄膜组件的制造方法以及具有该防护薄膜组件的光掩模的制造方法
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摘要
Foreign object particles generated at the time of trimming is suppressed from being attached to a pellicle film. A method for producing a pellicle according to the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.
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