首页> 外国专利> Field effect transistor constructions with gate insulator having local regions radially there-through that have different capacitance at different circumferential locations relative to a channel core periphery

Field effect transistor constructions with gate insulator having local regions radially there-through that have different capacitance at different circumferential locations relative to a channel core periphery

机译:具有栅极绝缘体的场效应晶体管构造具有径向贯穿的局部区域,这些局部区域相对于沟道芯外围在不同的圆周位置处具有不同的电容

摘要

A field effect transistor construction includes a semiconductive channel core. A source/drain region is at opposite ends of the channel core. A gate is proximate a periphery of the channel core. A gate insulator is between the gate and the channel core. The gate insulator has local regions radially there-through that have different capacitance at different circumferential locations relative to the channel core periphery. Additional constructions, and methods, are disclosed.
机译:场效应晶体管构造包括半导体沟道核。源极/漏极区域位于沟道核心的相对两端。栅极靠近沟道核心的外围。栅极绝缘体在栅极和沟道芯之间。栅极绝缘体具有径向贯穿的局部区域,该局部区域在相对于沟道芯外围的不同圆周位置处具有不同的电容。公开了其他构造和方法。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号