首页> 外国专利> TFT DEVICE FOR MEASURING CONTACT RESISTANCE AND MEASUREMENT METHOD FOR CONTACT RESISTANCE

TFT DEVICE FOR MEASURING CONTACT RESISTANCE AND MEASUREMENT METHOD FOR CONTACT RESISTANCE

机译:TFT装置的接触电阻的测定及接触电阻的测定方法

摘要

A TFT device for measuring a contact resistance and a measurement method for a contact resistance are disclosed. The TFT includes an active layer, a gate electrode and a gate insulation layer. The active layer includes a channel and at least three doping regions. Two of the at least three doping regions is connected through a channel. To measure the contact resistance, two of the at least three doping regions are selected and used as testing points for measuring. The gate electrode is disposed to correspond to the channel. The gate insulation layer insulatively isolates the active layer from the gate electrode. Excellent uniformity can be achieved so that manufacturing, film forming quality, and interface property show similarity to the maximum degree. Accordingly, measurement accuracy is increased, and distribution region can be saved to thereby increase utilization of an experimental region.
机译:公开了一种用于测量接触电阻​​的TFT装置和一种用于接触电阻的测量方法。 TFT包括有源层,栅电极和栅绝缘层。有源层包括沟道和至少三个掺杂区。至少三个掺杂区中的两个通过沟道连接。为了测量接触电阻​​,选择至少三个掺杂区域中的两个,并将其用作用于测量的测试点。栅电极被设置为对应于沟道。栅绝缘层将有源层与栅电极绝缘地隔离。可以实现极好的均匀性,从而使制造,成膜质量和界面特性在最大程度上显示出相似性。因此,提高了测量精度,并且可以节省分布区域,从而增加了实验区域的利用率。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号